Technology of Surfaces and Interfaces

General characterization

Prerequisites

Available soon

Bibliography

-“Physical vapor deposition of thin films ” – John E. Mahan

-“Introduction to plasma physics” – Gurnett and Bhattacharjee

-“Physics of thin films ” – Maurice H. Francombe and John L. Vossen

-“Physical chemistry of surfaces” – Arthur W. Adamson, Alice P. Cast.

-“Physics at surfaces”- Andrew Zangwill.

-“An Introduction to ultrathin organic Films from Langmuir to Self-assembly”-Abraham Ulman.

-“Multilayer Thin Films- Sequential assembly of nanocomposite Materials”- Gero decher, Joseph B. Schlenoff, Jean-Marie Lehn.

Teaching method

The teaching-learning process includes classroom and laboratorial classes  moments as follows:

Lectures:

Lectures of 1 hour, supported by presentations in video projector, simulations and demonstrations.. Some classes will be reserved for the presentation of topics of the syllabus for the students.

Laboratorial Classes:

Presential classes and in groups, lasting for two hours.

Evaluation method

1.Completion  of  5 experimental  sections on production techniques and characterization of thin films. Preparation of a report and a presentation about the production of a particular thin film and  characterization. In this component will be assigned a rating, NP. This note must be greater than or equal to ten values ​​for the student to be admitted to the examination or approval of the discipline.

2. Completion of  two tests. In this component, the average of the two tests will be assigned a rating, NT. The average of the tests must be greater than or equal to ten values ​​for approval of the discipline.

3. Presentation on a topic to be determined. In this component will be assigned a rating, NA.

4. The final NF continuous assessment will be given taking into account the following relationship:

N_F=0,5N_T + 0,3N_P +0,2N_A

To pass the subject of this note will be greater than or equal to ten values​​.

5.Se the student for the examination score shall be obtained by the expression defined in the previous section by replacing the average grade of the exam grade tests. To pass the subject of this note will be greater than or equal to ten values​​.

6.All ratings will be given values ​​between 0 and 20 classifications of components are rounded to one decimal place and the final units.

Alterado: Susana Isabel Santos Silva Sério VenceslauEm: 2014-02-26 14:57

Subject matter

1. Introduction to Physics of Surfaces

1.1. Definitions and physical properties of surfaces

1.2. Thermodynamics of surfaces (2D)

1.3. Surface tension, contact angle and capillary

1.4. Mechanical, Electrical and Optical properties

1.5. Processing surfaces and changes its properties

2. Thin films and coatings

2.1. Technology and vacuum evaporation

2.2. Deposition of thin films by chemical and physical methods

2.3. Introduction to Physics of Plasmas and magnetron discharges

2.4. Use of sputtering in thin film

2.5. Preparation of surfaces (substrates)

2.6. Application of plasmas to surface treatments

2.7. Obtaining patterns in thin films

3. Nature of thin films and coatings

3.1. Condensation, nucleation and growth of thin films

3.2. Structures in thin films

3.3. Thickness, composition, mechanical, electrical and optical properties of thin films

4. Technological applications of thin films and coatings

4.1. Resistors, capacitors and electronic active components

4.2. Devices magnetic and superconducting thin films

4.3. Thin films in integrated devices (Microelectronics)

4.4. Decorative thin films

4.5. Hard films and mechanical applications

4.6. Biocompatible Films

4.7. Physical Properties of Graphene and Applications

4.8. Hydrophobic and hydrophilic surfaces

4.9. Atomic Manipulation and formation of nanostructures

5. Methods of Organic Thin Films

5.1. Molecular monolayers

5.1.1. Langmuir

5.1.2. chemical adsorption

5.1.3. physical adsorption

5.2. Molecular Heterostructures

5.2.1. Filmes de Langmuir Blodgett

5.2.2.Layer-by-layer method

5.2.3. "Spray" method

5.2.4. Molecular encapsulation

5.2.5. Inkjet

5.2.6. Dedicated lithography 

Programs

Programs where the course is taught: