Plasma Technology and Thin Films
Objectives
This UC will provide a deep understanding of various deposition techniques using plasma technology and other technological applications, allowing students to become familiar with the key scientific issues associated with these technologies in order to contribute to the resolution of their research problems. It is also intended to give them the skills associated with a doctoral degree, namely systematic understanding in the scientific field, research skills, critical analysis of concepts and results, implementation of projects, written and oral communication techniques, among others.
General characterization
Code
9555
Credits
6.0
Responsible teacher
André João Maurício Leitão do Valle Wemans, Susana Isabel Santos Silva Sério Venceslau
Hours
Weekly - Available soon
Total - 84
Teaching language
Português
Prerequisites
It is recommended to have a curricular unit in Solid State Physics, Surface and Interfaces Technology or similar in basic training.
Bibliography
-“Physical vapor deposition of thin films ” – John E. Mahan, Wiley, 2000.
-“Introduction to plasma physics” – D. A. Gurnett and A. Bhattacharjee, 2nd ed., Cambridge University Press, 2017.
-“Physics of thin films ” – Maurice H. Francombe and John L. Vossen, ACADEMIC PRESS, INC., 1982.
Teaching method
This curricular unit will work on the basis of tutorial sessions and works to be carried out and presented throughout the semester.
Evaluation method
This curricular unit will work on the basis of tutorial sessions and works to be carried out and presented throughout the semester.
Subject matter
Introduction to Plasma Physics. Plasma frequency, temperatures and densities; Shield and Debye sphere. Electric discharge; Charge creation and annihilation processes; Glow discharge; Diode discharge schemes; Paschen''s Law; Child-Langmuir Law; Simple Diode Discharges, DC Discharges, RF Discharges and Magnetron Discharges; Types of cathodes; Variants of Magnetron Discharges: “High Power Impulse Magnetron Sputtering”, Balanced and Unbalanced Magnetron Discharge and Arc Plasma Deposition; Application of plasmas in changing surface properties (surface treatments) and Obtaining patterns in thin films; Technological applications based on plasma technology.